問い合わせ番号

INS-0000000377

Overview of XAFS measurement system on optical bench

  In the experimental hutch, measurement equipments are prepared for XAFS measurements, including detectors, a cryostat, electric furnaces, stages and a slit [1]. The beam height changes from 0 to 250 mm together with the glancing angle of the mirror. To follow the beam height, the measurement equipments are mounted on the Al honeycomb base, which can be adjusted by a pulse motor-driven vertical translation stage. Available measurement modes of XAFS are described in the following sections.

Schematic view of optical bench for XAFS measurement system

Detectors

• Ionization chambers
• Lytle detector
• 19-element Ge detector
• Conversion electron yield (CEY) detector

Sample temperature controllers

• Water-cooled electric furnace with Kapton window
  • Control range of temperature : 295 ∼ 1070 K
• Muffle furnace with Kapton window
  • Control range of temperature : 295 ∼ 1870 K
• Cryostat with Kapton window
  • Control range of temperature : 10 ∼ 300 K
  • Stability : ∼ ± 0.1 K
  • Cooling power : 8 W (2nd stage @20 K)

Optics

• θ-2θ stage with Z stage
  • Step θ : 0.005 arcsec/pulse, 2θ : 0.002 deg/pulse
• Vertical translation stage for optical bench
  • Size : 1.2 × 2 m²
  • Stroke : 250 mm
  • Step : 0.5 µm/pulse
• Slits
  • Stepping motor driven blade : 3 mm thick tantalum
  • Stroke : ± 10 mm
  • Step : 2 µm/pulse

Measurement devices

Power supply for NIM bin, High-voltage power supplies for ion chamber and Ge-SSD, Current amplifier, 2ch filter, VF converter, Quad counter, Spectroscopy amplifier, SCA, MCA etc.

References

1. T. Uruga, H. Tanida, Y. Yoneda, K. Takeshita, S. Emura, M. Takahashi, M. Harada, stextY. Nishihata, Y. Kubozono, T. Tanaka, T. Yamamoto, H. Maeda, O. Kamishima, Y. Takabayashi, Y. Nakata, H. Kimura, S. Goto, and T. Ishikawa, J. Shynchrotron Rad. 6, 143 (1999).